Launching soon: 3.3 kV 25 mΩ and 50 mΩ high-current SiC MOSFETs, and 6.5 kV SiC MOSFETs

July 19, 2021

NoMIS Power awarded SBIR by DMEA for high temperature technology on SiC

July 19, 2021

July 29, 2021, Albany, NY – The team of NoMIS Power, State University of New York Polytechnic Institute, and North Carolina State University was notified by the Defense Microelectronics Activity (DMEA) that it was awarded a Phase I SBIR for “Manufacturing Platform for High-Temperature CMOS ICs on SiC.” The project objectives are to develop high-temperature (> 300 °C) operational dielectrics, low- and high-voltage devices, and packaging for SiC CMOS integrated circuits technologies in a production-grade fabrication facility in the U.S. The end goal is to establish a manufacturing platform for high-temperature BCD (Bipolar-CMOS-DMOS) technology on SiC that will be able to provide new semiconductor technology for system integrators and builders incorporating power, sensing, and control electronics into applications that operate in harsh environments.